Robustify ML-based Lithography Hotspot Detectors
Published in IEEE/ACM International Conference on Computer Aided Design (ICCAD), 2022
This paper presents methods to improve the robustness of machine learning-based lithography hotspot detection systems against various manufacturing variations and process conditions.
Recommended citation: Jingyu Pan, Chen-Chia Chang, Zhiyao Xie, Jiang Hu, Yiran Chen. (2022). "Robustify ML-based Lithography Hotspot Detectors." IEEE/ACM International Conference on Computer Aided Design (ICCAD).
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